This image is imagemapped.
Photolithography room with photoresist spin developer at left and Karl Suss MJB 55 mask aligner on right. Aligner is capable of positioning mask to within .2 microns and is used to align photomasks with previously delineated features on GaAs wafers. Minimium feature size is about 1 micron with light souce used. Back wall is made up of HEPA filters
